Physical Vapor Deposition of [EMIM][Tf2N]: A New Approach to the Modification of Surface Properties with Ultrathin Ionic Liquid Films

Published 2008 View Full Article

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Title
Physical Vapor Deposition of [EMIM][Tf2N]: A New Approach to the Modification of Surface Properties with Ultrathin Ionic Liquid Films
Authors
Keywords
-
Journal
CHEMPHYSCHEM
Volume 9, Issue 15, Pages 2185-2190
Publisher
Wiley
Online
2008-10-08
DOI
10.1002/cphc.200800300

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