Diffusion maps based k-nearest-neighbor rule technique for semiconductor manufacturing process fault detection

Published 2014 View Full Article

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Title
Diffusion maps based k-nearest-neighbor rule technique for semiconductor manufacturing process fault detection
Authors
Keywords
-
Journal
CHEMOMETRICS AND INTELLIGENT LABORATORY SYSTEMS
Volume 136, Issue -, Pages 47-57
Publisher
Elsevier BV
Online
2014-05-14
DOI
10.1016/j.chemolab.2014.05.003

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