Journal
CHEMISTRY OF MATERIALS
Volume 26, Issue 23, Pages 6819-6826Publisher
AMER CHEMICAL SOC
DOI: 10.1021/cm5034436
Keywords
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Funding
- National Science Foundation Grant of United States [CHE 1214109, 1307918, 1240374, 0954202]
- Major International Joint Research Project [51210004]
- National Natural Science Foundation [51433002]
- Guangzhou Nansha Research Funds of China [2013C007]
- China Scholarship Council [201206160040]
- Directorate For Engineering
- Div Of Electrical, Commun & Cyber Sys [1307918] Funding Source: National Science Foundation
- Division Of Chemistry
- Direct For Mathematical & Physical Scien [1214109] Funding Source: National Science Foundation
- Emerging Frontiers & Multidisciplinary Activities
- Directorate For Engineering [1240374] Funding Source: National Science Foundation
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Freestanding substrates with high refractive index modulation, good oxygen resistance, and low volume shrinkage are critical in photolithography for the purpose of high density data storage, image patterning and anticounterfeiting. Herein, we demonstrate a novel paradigm of direct holographic image patterning via the radical-mediated thiolyne click reaction subsequent to the base-catalyzed thiol-Michael addition reaction. With the benefit of a newly synthesized alkyne monomer, 9-(2-((2-(prop-2-yn-1-yloxy)ethyl)thio)ethyl)-9H-carbazole (POETEC), holograms with as high as 96% diffraction efficiency, refractive index modulation of 0.0036, dynamic range of 5.6 per 200 mu m and volume shrinkage of 1.1%, are successfully patterned in an aerobic environment. Uniquely and distinctly, an inhibitor is unnecessary to prevent the initiation of the sequential reaction in this framework.
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