Atomic Layer Deposition of Al2O3 onto Sn-Doped In2O3: Absence of Self-Limited Adsorption during Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al2O3

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Title
Atomic Layer Deposition of Al2O3 onto Sn-Doped In2O3: Absence of Self-Limited Adsorption during Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al2O3
Authors
Keywords
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Journal
CHEMISTRY OF MATERIALS
Volume 24, Issue 23, Pages 4503-4510
Publisher
American Chemical Society (ACS)
Online
2012-11-20
DOI
10.1021/cm301732t

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