Highly Selective Chemical Vapor Deposition of Tin Diselenide Thin Films onto Patterned Substrates via Single Source Diselenoether Precursors

Published 2012 View Full Article

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Title
Highly Selective Chemical Vapor Deposition of Tin Diselenide Thin Films onto Patterned Substrates via Single Source Diselenoether Precursors
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 24, Issue 22, Pages 4442-4449
Publisher
American Chemical Society (ACS)
Online
2012-10-18
DOI
10.1021/cm302864x

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