Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time

Title
Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 24, Issue 8, Pages 1407-1414
Publisher
American Chemical Society (ACS)
Online
2012-04-09
DOI
10.1021/cm200989t

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