3.9 Article

Remote Plasma-Assisted CVD Growth of Carbon Nanotubes in an Optimised Rapid Thermal Reactor

Journal

CHEMICAL VAPOR DEPOSITION
Volume 18, Issue 1-3, Pages 17-21

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.201106925

Keywords

-

Funding

  1. Enterprise Ireland CCAN EI [CC_/2008/0503.B]
  2. Science Foundation Ireland under the CSET
  3. IRCSET

Ask authors/readers for more resources

The advances in the use of a remote plasma in combination with a rapid radiative reactor in plasma-enhanced (PE) CVD is presented here. The characteristics and parameters of this system are fully analyzed and compared with conventional CVD growth methods. Growth of multi- and single-walled carbon nanotubes (CNTs) at low temperatures with high quality and reproducibility has been achieved in this way. Further, a new catalytic system, which gives dense multi-wall CNTs on metal substrates, is presented.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

3.9
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available