Journal
CHEMICAL VAPOR DEPOSITION
Volume 18, Issue 1-3, Pages 17-21Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.201106925
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Funding
- Enterprise Ireland CCAN EI [CC_/2008/0503.B]
- Science Foundation Ireland under the CSET
- IRCSET
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The advances in the use of a remote plasma in combination with a rapid radiative reactor in plasma-enhanced (PE) CVD is presented here. The characteristics and parameters of this system are fully analyzed and compared with conventional CVD growth methods. Growth of multi- and single-walled carbon nanotubes (CNTs) at low temperatures with high quality and reproducibility has been achieved in this way. Further, a new catalytic system, which gives dense multi-wall CNTs on metal substrates, is presented.
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