4.4 Article

Conducting Si-doped γ-Ga2O3 epitaxial films grown by pulsed-laser deposition

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 421, Issue -, Pages 23-26

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2015.04.011

Keywords

Doping; Pulsed-laser deposition; gamma-Ga2O3; Semiconducting gallium compounds

Funding

  1. JSPS
  2. MEXT the Element Strategy initiative Project
  3. research grant from Hitachi Metals Materials Science Foundation
  4. Grants-in-Aid for Scientific Research [26709020, 15H03881] Funding Source: KAKEN

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We report structural, electrical, and optical properties of Si doped gamma-Ga2O3 films epitaxially grown on (100) MgAl2O4 substrate by pulsed-laser deposition. The gamma-Ga2O3:Si films of a metastable spinet phase had neither secondary phase nor rotation domain. A highly doped film exhibited n-type conductivity with a carrier concentration of 1.8 x 10(19) cm(-3) and a Hall mobility of 1.6 cm(2) V-1 s(-1) at 300 K. Donor activation energy was estimated to be less than 7 meV from nearly temperature-independent transport Properties down to 77 K. The successful impurity doping indicates that gamma-Ga2O3 can be used as an n-type wide-band-gap semiconductor. (C) 2015 Elsevier B.V. All rights reserved.

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