4.8 Article

3D ToF-SIMS Imaging of Polymer Multi layer Films Using Argon Cluster Sputter Depth Profiling

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 4, Pages 2654-2659

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/am507663v

Keywords

ToF-SIMS; argon; depth; profiling; polymer; multilayers

Funding

  1. Engineering and Physical Sciences Research Council [EP/K005138/1] Funding Source: researchfish
  2. National Physical Laboratory [117362] Funding Source: researchfish
  3. EPSRC [EP/K005138/1] Funding Source: UKRI

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ToF-SIMS imaging with argon cluster sputter depth profiling has provided detailed insight into the three-dimensional (3D) chemical composition of a series of polymer multilayer structures. Depths of more than 15 mu m were profiled in these samples while maintaining uniform sputter rates. The 3D chemical images provide information regarding the structure of the multilayer systems that could be used to inform future systems manufacturing and development. This also includes measuring the layer homogeneity, thickness, and interface widths. The systems analyzed were spin-cast multilayers comprising alternating polystyrene (PS) and polyvinylpyrrolidone (PVP) layers. These included samples where the PVP and PS layer thickness values were kept constant throughout and samples where the layer thickness was varied as a function of depth in the multilayer. The depth profile data obtained was observed to be superior to that obtained for the same materials using alternative ion sources such as C-60(n+). The data closely reflected the as manufactured sample specification, exhibiting good agreement with ellipsometry measurements of layer thickness, while also maintaining secondary ion intensities throughout the profiling regime. The unprecedented quality of the data allowed a detailed analysis of the chemical structure of these systems, revealing some minor imperfections within the polymer layers and demonstrating the enhanced capabilities of the argon cluster depth profiling technique.

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