Influence of pulsed substrate bias on the structure and properties of Ti–Al–N films deposited by cathodic vacuum arc

Published 2012 View Full Article

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Title
Influence of pulsed substrate bias on the structure and properties of Ti–Al–N films deposited by cathodic vacuum arc
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 19, Pages 7274-7279
Publisher
Elsevier BV
Online
2012-04-06
DOI
10.1016/j.apsusc.2012.03.100

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