Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Published 2011 View Full Article

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Title
Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 8, Pages 3864-3870
Publisher
Elsevier BV
Online
2011-12-18
DOI
10.1016/j.apsusc.2011.12.048

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