Atomic layer deposition of ZnO on thermal SiO2 and Si surfaces using N2-diluted diethylzinc and H2O2 precursors

Authors

Keywords

Journal

Volume 258, Issue 10, Pages 4657-4666

Publisher

Elsevier BV

Online

2012-01-18

DOI

10.1016/j.apsusc.2012.01.054

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