Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 10, Pages 4213-4221Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2011.12.004
Keywords
X-ray photoelectron spectroscopy; Capacitance-voltage characterization; 3-Aminopropyltrimethoxysilane; Low-k materials
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Funding
- Brandenburg University of Technology International Graduate School
- Bundesministerium fur Bildung und Forschung (BMBF) [Nano-Analytik 13N9431]
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We report on studies about novel 3-aminopropyltrimethoxysilane (APTMS) based hybrid composites doped by copper phthalocyanine (CuPc), [6,6]-phenyl-C-61-butyric acid methyl ester and tris(dimethylvinylsilyloxy)-POSS (POSS). APTMS was used as siloxane matrix in order to produce thin layers of composite materials spin-coated onto silicon. The surface chemistry and the dielectric properties were investigated by the combination of X-ray photoelectron spectroscopy and capacitance voltage technique. We observed strong correlations between the dopant concentration and the chemical composition, homogeneity and electrical properties (permittivity, hysteresis) of the produced layers. Hence, an increase of the surfaces chemical resistance against the ambient conditions due to the POSS incorporation into the siloxane matrix was found. Furthermore, this work demonstrates that a properly chosen concentration of CuPc and POSS dopants within the siloxane matrix leads to homogenous films with an extremely low dielectric constant in the range of 1.8. (C) 2011 Elsevier B.V. All rights reserved.
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