Raman and TEM characterization of high fluence C implanted nanometric Si on insulator

Published 2012 View Full Article

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Title
Raman and TEM characterization of high fluence C implanted nanometric Si on insulator
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 258, Issue 19, Pages 7395-7400
Publisher
Elsevier BV
Online
2012-04-13
DOI
10.1016/j.apsusc.2012.04.044

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