Journal
APPLIED SURFACE SCIENCE
Volume 257, Issue 18, Pages 8093-8101Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2011.04.113
Keywords
Controlled solvent vapor pressure annealing; Diblock copolymers; Self-assembly
Categories
Funding
- National Natural Science Foundation of China [20774095, 21074135]
- National Basic Research Program of China [2005CB623806]
- Liaoning Province Foundation for Doctors [910502]
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The morphology formation and transition of thin film of a cylinder-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer annealed under 1,1,2-trichloroethane (Tri-CE), toluene (Tol), and their binary mixed solvent vapors is investigated by using optical microscopy (OM) and transmission electronic microscopy (TEM). By modulating the annealing solvent vapor pressure and the preferential affinities, a detailed morphology evolution with increasing the vapor pressure and a series of morphologies depending on the preferential affinities have been observed. A phase diagram by plotting the morphologies as a function of the annealing solvent vapor pressure and its preferential affinity is subsequently constructed. (C) 2011 Elsevier B.V. All rights reserved.
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