4.7 Article

Reversible wettability of nanostructured ZnO thin films by sol-gel method

Journal

APPLIED SURFACE SCIENCE
Volume 256, Issue 14, Pages 4720-4723

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2010.02.080

Keywords

ZnO; Sol-gel; Surface topography; Reversible wettability; Hydrophobicity

Funding

  1. National Natural Science Foundation of China [50872001]
  2. Higher Education of China [20060357003]
  3. Talent Foundation of Anhui Province [2004Z029]
  4. Natural Science Foundation of Anhui Higher Education Institution of China [KJ2010A284]

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Nanostructured ZnO thin films were deposited on Si(1 1 1) and quartz substrate by sol-gel method. The thin films were annealed at 673 K, 873 K, and 1073 K for 60 min. Microstructure, surface topography, and water contact angle of the thin films have been measured by X-ray diffractometer, atomic force microscopy, and water contact angle apparatus. XRD results showed that the ZnO thin films are poly-crystalline with hexagonal wurtzite structure. AFM studies revealed that rms roughness changes from 2.3 nm to 7.4 nm and the grain size grow up continuously with increasing annealing temperature. Wettability results indicated that hydrophobicity of the un-irradiated ZnO thin films enhances with annealing temperature increase. The hydrophobic ZnO surfaces could be reversibly switched to hydrophilic by alternation of UV illumination and dark storage (thermal treatment). By studying the magnitude and the contact angle reduction rate of the light-induced process, the contribution of surface roughness is discussed. (C) 2010 Elsevier B. V. All rights reserved.

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