Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 7, Pages 3913-3917Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2008.07.190
Keywords
a-C:N; CFUBM sputtering; Tribological properties; Friction coefficient
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Funding
- Center of Excellency Program of the Korea Science and Engineering Foundation, MOST through the Center for Advanced Plasma Surface Technology (CAPST) [R11-2000-086-0000-0]
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Nitrogen doped amorphous carbon (a-C:N) films are a material that may successfully compete with DLC coatings, which have high hardness, high wear resistance, and a low friction coefficient. The a-C: N films were prepared on silicon substrate by a closed-field unbalanced magnetron sputtering method with a graphite target and using the Ar/N-2 mixture gases. And, we investigated the effects of various DC bias voltages from 0 to - 300 V on the structural and tribological properties of the a-C: N films. This study was focused on improving physical properties of the a-C: N film by controlling process parameters like negative substrate DC bias voltage. The maximum hardness of the a-C: N film was 23 GPa, the friction coefficient was 0.08, and the critical load was 25 N on a Si wafer. Consequently, the structural and tribological properties of the a-C: N film showed a clear dependence on the energy of ions bombardment and the density of the sputtering and the reaction gases during film growth. (C) 2008 Elsevier B. V. All rights reserved.
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