Strain relaxation in SiGe layer during wet oxidation process

Published 2008 View Full Article

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Title
Strain relaxation in SiGe layer during wet oxidation process
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 6, Pages 3701-3705
Publisher
Elsevier BV
Online
2008-10-18
DOI
10.1016/j.apsusc.2008.10.022

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