Journal
APPLIED SURFACE SCIENCE
Volume 254, Issue 17, Pages 5439-5444Publisher
ELSEVIER
DOI: 10.1016/j.apsusc.2008.02.073
Keywords
X-ray photoelectron spectroscopy (XPS); sputtering; spectroscopy ellipsometry; band-offset
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ZrOxNy thin films have been prepared by radio frequency magnetron sputtering at various substrate temperatures. The effect of substrate temperature on structural, optical properties and energy-band alignments of as-deposited ZrOxNy thin films are investigated. Atomic force microscopy results indicate the decreased root-mean-square (rms) values with substrate temperature. Fourier transform infrared spectroscopy spectra indicate that an interfacial layer has been formed between Si substrate and ZrOxNy thin films during deposition. X-ray photoelectron spectroscopy and spectroscopy ellipsometry (SE) results indicate the increased nitrogen incorporation in ZrOxNy thin films and therefore, the decreased optical band gap (E-g) values as a result of the increased valence-band maximum and lowered conduction-band minimum. (C) 2008 Elsevier B.V. All rights reserved.
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