Molecular depth profiling of trehalose using a C60 cluster ion beam

Molecular depth profiling of organic overlayers was performed using a mass selected fullerene ion beam in conjunction with time-of-flight ( TOF-SIMS) mass spectrometry. The characteristics of depth profiles acquired on a 300-nm trehalose film on Si were studied as a function of the impact kinetic energy and charge state of the C(60) projectile ions. We find that the achieved depth resolution depends only weakly upon energy. (C) 2008 Elsevier B. V. All rights reserved.