Quantitative SIMS measurement of high concentration of boron in silicon (up to 20at.%) using an isotopic comparative method

Published 2008 View Full Article

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Title
Quantitative SIMS measurement of high concentration of boron in silicon (up to 20at.%) using an isotopic comparative method
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 4, Pages 1377-1380
Publisher
Elsevier BV
Online
2008-05-09
DOI
10.1016/j.apsusc.2008.05.051

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