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Title
Ion traps fabricated in a CMOS foundry
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 105, Issue 4, Pages 044103
Publisher
AIP Publishing
Online
2014-08-01
DOI
10.1063/1.4892061
References
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Related references
Note: Only part of the references are listed.- Insensitivity of the rate of ion motional heating to trap-electrode material over a large temperature range
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- (2014) R. C. Sterling et al. Nature Communications
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- (2013) U. Warring et al. PHYSICAL REVIEW A
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- (2013) Grahame Vittorini et al. REVIEW OF SCIENTIFIC INSTRUMENTS
- A monolithic array of three-dimensional ion traps fabricated with conventional semiconductor technology
- (2012) Guido Wilpers et al. Nature Nanotechnology
- Open foundry platform for high-performance electronic-photonic integration
- (2012) Jason S. Orcutt et al. OPTICS EXPRESS
- Loading of a surface-electrode ion trap from a remote, precooled source
- (2012) Jeremy M. Sage et al. PHYSICAL REVIEW A
- Heating rate and electrode charging measurements in a scalable, microfabricated, surface-electrode ion trap
- (2011) D. T. C. Allcock et al. APPLIED PHYSICS B-LASERS AND OPTICS
- Single-qubit-gate error below10−4in a trapped ion
- (2011) K. R. Brown et al. PHYSICAL REVIEW A
- A low-noise, single-photon avalanche diode in standard 0.13 μm complementary metal-oxide-semiconductor process
- (2010) Ryan M. Field et al. APPLIED PHYSICS LETTERS
- Entangled states of trapped atomic ions
- (2008) Rainer Blatt et al. NATURE
- Towards fault-tolerant quantum computing with trapped ions
- (2008) Jan Benhelm et al. Nature Physics
- Suppression of Heating Rates in Cryogenic Surface-Electrode Ion Traps
- (2008) Jaroslaw Labaziewicz et al. PHYSICAL REVIEW LETTERS
- High-Fidelity Readout of Trapped-Ion Qubits
- (2008) A. H. Myerson et al. PHYSICAL REVIEW LETTERS
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