4.6 Article

A pH sensor with a double-gate silicon nanowire field-effect transistor

Journal

APPLIED PHYSICS LETTERS
Volume 102, Issue 8, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4793655

Keywords

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Funding

  1. National Research and Development Program [2012-0001131]
  2. Center for Integrated Smart Sensors
  3. Ministry of Education, Science and Technology [CISS-2012M3A6A6054187]
  4. National Research Foundation of Korea [2005-2001274, 2011-0031848] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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A pH sensor composed of a double-gate silicon nanowire field-effect transistor (DG Si-NW FET) is demonstrated. The proposed DG Si-NW FET allows the independent addressing of the gate voltage and hence improves the sensing capability through an application of asymmetric gate voltage between the two gates. One gate is a driving gate which controls the current flow, and the other is a supporting gate which amplifies the shift of the threshold voltage, which is a sensing metric, and which arises from changes in the pH. The pH signal is also amplified through modulation of the gate oxide thickness. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4793655]

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