4.6 Article

Enhanced performance of GaN based light-emitting diodes with a low temperature p-GaN hole injection layer

Journal

APPLIED PHYSICS LETTERS
Volume 102, Issue 1, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4773558

Keywords

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Funding

  1. National High Technology Program of China [2011AA03A105, 2011AA03A103]

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A hole injection layer (HIL) is designed in GaN-based light emitting diodes (LEDs) between multiple quantum wells and p-AlGaN electron blocking layer (EBL). Based on numerical simulation by APSYS, the band diagram is adjusted by HIL, leading to the improved hole-injection efficiency. The designed HIL is a p-GaN buffer layer grown at low temperature (LT_pGaN) on last quantum barrier before p-AlGaN EBL. The output power of the fabricated GaN-based LED device with LT_pGaN HIL is enhanced by 128% at 100 A/cm(2), while the efficiency droop is reduced by 33% compared to the conventional LED. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4773558]

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