4.6 Article

High-quality epitaxial NbN/AlN/NbN tunnel junctions with a wide range of current density

Journal

APPLIED PHYSICS LETTERS
Volume 102, Issue 14, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4801972

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Funding

  1. Funding Program for World-Leading Innovative R&D on Science and Technology (FIRST)
  2. NICT Commissioned Research
  3. Project for Developing Innovation Systems of MEXT
  4. Grants-in-Aid for Scientific Research [25420352, 23560431] Funding Source: KAKEN

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We have developed high-quality epitaxial NbN/AlN/NbN Josephson tunnel junctions with a wide range of current density J(c). The junctions show excellent tunneling properties with a large gap voltage of 5.6 mV and a large IcRN product of 3.5 mV. The quality factor R-sg/R-N is about 60 for the junctions with a J(c) of 2.2 A/cm(2), and above 10 for the junctions with a J(c) of 25 kA/cm(2). The crystal structures across the junction barrier are investigated using x-ray diffraction and cross-sectional scanning transmission electron microscopy, and demonstrate epitaxial growth of the NbN/AlN/NbN trilayers for the wide range of J(c). (C) 2013 AIP Publishing LLC

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