Journal
APPLIED PHYSICS LETTERS
Volume 101, Issue 17, Pages -Publisher
AIP Publishing
DOI: 10.1063/1.4761961
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- ST Microelectronics RD in Catania
- LAST POWER project (ENIAC Joint Undertaking) [120218]
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In this letter, the conduction mechanism through epitaxial nickel oxide (NiO) dielectric films grown by metal-organic chemical vapor deposition on AlGaN/GaN heterostructures was investigated. In particular, macroscopic current-voltage measurements carried out at different temperatures allowed to demonstrate that Poole-Frenkel (PF) mechanism rules the conduction through the dielectric layer, with an emission barrier of 0.2 eV. Conductive atomic force microscopic measurements were carried out to directly image the presence of preferential current spots on the NiO surface, which have been correlated to the defects responsible for the PF emission. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4761961]
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