Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas

Published 2011 View Full Article

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Title
Substrate heating influence on the deposition rate of oxides during pulsed laser deposition in ambient gas
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 98, Issue 10, Pages 101501
Publisher
AIP Publishing
Online
2011-03-11
DOI
10.1063/1.3565157
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