Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors

Title
Impact of static and dynamic stress on threshold voltage instability in high-k/metal gate n-channel metal-oxide-semiconductor field-effect transistors
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 98, Issue 9, Pages 092112
Publisher
AIP Publishing
Online
2011-03-05
DOI
10.1063/1.3560463

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