Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime

Title
Stress evolution during the oxidation of silicon nanowires in the sub-10 nm diameter regime
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 99, Issue 14, Pages 143115
Publisher
AIP Publishing
Online
2011-10-08
DOI
10.1063/1.3643038

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