Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 15, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3119622
Keywords
energy gap; evaporation; fracture; high-speed optical techniques; photoluminescence; polishing; silicon compounds; time resolved spectra
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Funding
- U.S. Department of Energy [DE-AC52-07NA27344]
- Laboratory Directed Research and Development (LDRD)
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Using high-sensitivity confocal time-resolved photoluminescence (PL) techniques, we report an ultrafast PL (40 ps-5 ns) from impurity-free surface flaws on fused silica, including polished, indented, or fractured surfaces of fused silica, and from laser-heated evaporation pits. This PL is excited by the single-photon absorption of sub-band gap light, and is especially bright in fractures. Regions which exhibit this PL are strongly absorptive well below the band gap, as evidenced by a propensity to damage with 3.5 eV nanosecond-scale laser pulses.
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