Electrode kinetics of Cu–SiO2-based resistive switching cells: Overcoming the voltage-time dilemma of electrochemical metallization memories

Published 2009 View Full Article

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Title
Electrode kinetics of Cu–SiO2-based resistive switching cells: Overcoming the voltage-time dilemma of electrochemical metallization memories
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 94, Issue 7, Pages 072109
Publisher
AIP Publishing
Online
2009-02-20
DOI
10.1063/1.3077310
References
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