4.6 Article

Near-infrared intersubband absorption in molecular-beam epitaxy-grown lattice-matched InAlN/GaN superlattices

Journal

APPLIED PHYSICS LETTERS
Volume 94, Issue 16, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3120551

Keywords

aluminium compounds; gallium compounds; III-V semiconductors; indium compounds; molecular beam epitaxial growth; semiconductor quantum wells; semiconductor superlattices; silicon; wide band gap semiconductors; X-ray diffraction

Funding

  1. Research Corporation Cottrell College [7331]

Ask authors/readers for more resources

Strong near-infrared intersubband absorption is observed directly at room temperature in silicon-doped lattice-matched InAlN/GaN superlattices grown by molecular-beam epitaxy on GaN templates grown by hydride vapor-phase epitaxy. X-ray diffraction characterization of the heterostructures indicates excellent layer thickness uniformity and low interface roughness. For 2-4.5 nm quantum wells, the intersubband transition energies span the technologically relevant range between 2.3 and 2.9 mu m. The experimental results are in good agreement with calculations of the transition energies using a conduction band offset of 1 eV and spontaneous polarization of 3 MV/cm.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available