Impact of thermal oxygen annealing on the properties of tin oxide films and characteristics of p-type thin-film transistors

Published 2015 View Full Article

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Title
Impact of thermal oxygen annealing on the properties of tin oxide films and characteristics of p-type thin-film transistors
Authors
Keywords
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Journal
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 55, Issue 1, Pages 016501
Publisher
Japan Society of Applied Physics
Online
2015-11-26
DOI
10.7567/jjap.55.016501

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