Laser annealed HfxZr1−xO2 high-k dielectric: Impact on morphology, microstructure, and electrical properties

Published 2008 View Full Article

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Title
Laser annealed HfxZr1−xO2 high-k dielectric: Impact on morphology, microstructure, and electrical properties
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 92, Issue 11, Pages 113501
Publisher
AIP Publishing
Online
2008-03-18
DOI
10.1063/1.2898710
References
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