GeOx interface layer reduction upon Al-gate deposition on a HfO2∕GeOx∕Ge(001) stack

Published 2008 View Full Article

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Title
GeOx interface layer reduction upon Al-gate deposition on a HfO2∕GeOx∕Ge(001) stack
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 92, Issue 17, Pages 172906
Publisher
AIP Publishing
Online
2008-05-01
DOI
10.1063/1.2917480
References
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