N2O-grown oxides/4H-SiC (0001), (033¯8), and (112¯0) interface properties characterized by using p-type gate-controlled diodes

Title
N2O-grown oxides/4H-SiC (0001), (033¯8), and (112¯0) interface properties characterized by using p-type gate-controlled diodes
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 93, Issue 19, Pages 193510
Publisher
AIP Publishing
Online
2008-11-14
DOI
10.1063/1.3028016

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started