Journal
APPLIED PHYSICS EXPRESS
Volume 7, Issue 3, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/APEX.7.034105
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- ETH through ETHDRA [16-11-1]
- FIRST Lab at ETH Zurich, Zurich, Switzerland
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The type-II staggered band lineup at the base-collector junction of InP/GaAsSb double-heterojunction bipolar transistors (DHBTs) eliminates the current blocking effect observed in InP/GalnAs DHBTs and allows the use of a pure binary InP collector that provides a high breakdown voltage and good thermal conductivity. Improvement of the power gain cutoff frequency f(MAX) requires a reduction in base resistance and/or base-collector capacitance. We have decreased the base contact resistivity by in situ Ar sputtering immediately prior to the base contact deposition. The resulting DHBTs simultaneously feature f(T) = 429 GHz and f(MAX) = 715 GHz. To the best of the authors' knowledge, this is the highest reported f(MAX) for InP/GaAsSb-based DHBTs to date. (C) 2014 The Japan Society of Applied Physics
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