4.5 Article

Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet

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APPLIED PHYSICS EXPRESS
Volume 5, Issue 5, Pages -

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IOP PUBLISHING LTD
DOI: 10.1143/APEX.5.056201

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The effect of hydrogen reduction on the characteristics of Cu films deposited using a 13.56 MHz RF Ar/H-2 atmospheric pressure plasma jet with a Cu thin wire set inside a quartz tube was studied. By adding a small amount of H-2 gas into Ar carrier gas, it was found that intense emissions of N-2 molecule second positive systems, OH and O emissions were significantly suppressed, while Cu and H alpha lines were intensified. It was confirmed by an X-ray photoelectron spectrometry that a high purity Cu film was synthesized via hydrogen reduction reaction, preventing the oxidization of Cu film. (c) 2012 The Japan Society of Applied Physics

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