Mechanism of Carrier Mobility Degradation Induced by Crystallization of HfO2Gate Dielectrics

Title
Mechanism of Carrier Mobility Degradation Induced by Crystallization of HfO2Gate Dielectrics
Authors
Keywords
-
Journal
Applied Physics Express
Volume 2, Issue -, Pages 071402
Publisher
IOP Publishing
Online
2009-06-19
DOI
10.1143/apex.2.071402

Ask authors/readers for more resources

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started