Atmospheric pressure chemical vapour deposition of WO3thin films from a volatile fluorinated tungsten oxo-alkoxide precursor, W(O)(OCH2CF3)4

Published 2008 View Full Article

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Title
Atmospheric pressure chemical vapour deposition of WO3thin films from a volatile fluorinated tungsten oxo-alkoxide precursor, W(O)(OCH2CF3)4
Authors
Keywords
-
Journal
APPLIED ORGANOMETALLIC CHEMISTRY
Volume 22, Issue 10, Pages 560-564
Publisher
Wiley
Online
2008-08-11
DOI
10.1002/aoc.1439

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