The Stoichiometry of Electroless Silicon Etching in Solutions of V2O5and HF
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Title
The Stoichiometry of Electroless Silicon Etching in Solutions of V2O5and HF
Authors
Keywords
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Journal
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
Volume 52, Issue 26, Pages 6731-6734
Publisher
Wiley
Online
2013-05-10
DOI
10.1002/anie.201300755
References
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