4.8 Article

Directed 2D-to-3D Pattern Transfer Method for Controlled Fabrication of Topologically Complex 3D Features in Silicon

Journal

ADVANCED MATERIALS
Volume 23, Issue 5, Pages 659-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201003833

Keywords

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Funding

  1. NSF [DMI 0403671]

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A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.

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