4.8 Article

Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography

Journal

ADVANCED MATERIALS
Volume 21, Issue 19, Pages 1921-1926

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200802434

Keywords

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Funding

  1. Direct For Mathematical & Physical Scien
  2. Division Of Materials Research [804449] Funding Source: National Science Foundation

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By employing a block copolymer to spatially organize silver nanoparticles, laser light can be concentrated via plasmon resonance to locally expose a photoresist. By subsequent development, this plasmonic lithography can provide deep subwavelength scale features.

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