4.8 Article

Ultra Low-k Films Derived from Hyperbranched Polycarbosilanes (HBPCS)

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 18, Issue 24, Pages 4022-4028

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.200801197

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Funding

  1. New York State Office of Science, Technologyand Academic Research

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Dense and porous hyperbranched carbosiloxane thin films (HBCSO) are obtained by sol-gel processing using methylene-bridged hyperbranched polycarbosilanes (HBPCSs) with the general compositional formula {(OMe)(2)Si(CH2)}. Introduction of porosity is achieved using a porogen templating approach, allowing the control of the films' dielectric constant from 2.9 to as low as 1.8. Over the entire dielectric range, the HBCSO films exhibit exceptional mechanical properties, 2-3 times superior to those obtained for non-alkylene bridged organosiloxanes such as methylsilsesquioxanes (MSSQs) of similar densities and k-values.

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