Journal
ADVANCED ENGINEERING MATERIALS
Volume 16, Issue 9, Pages 1090-1097Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adem.201400245
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Funding
- European Commission [214006]
- Deutsche Forschungsgemeinschaft (DFG) [GR 2695/8]
- Linkoping University, Department of Science and Technology [ITN-2010-00018]
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We report about a maskless technique to deposit colloidal polystyrene particles in patterned stripes with a line width as narrow as 1.5m. Our approach is based on the digital patterning of a hydrophobic octadecylsiloxane self-assembled monolayer (SAM) on a silicon oxide surface by laser-assisted decomposition and desorption of its organic parts. For hydrophilic stripes of the micropatterned SAM area down to widths of approximately 1.5m, we observed ordered, mainly monolayered stripes of colloidal polystyrene nanoparticles using a modified vertical deposition technique, dipping the silicon substrate into a colloidal suspension at an angle of around 45 degrees with respect to the surface normal of the liquid. The mechanism of this so-called slope self-assembly [Wu et al., Langmuir2013, 29, 14017] and its limitations with respect to stacking can be explained in the framework of a meniscus moving along the steps of alternating surface energy with the decreasing width of the hydrophilic stripes during the deposition process [Fustin et al., Langmuir2004, 20, 9114].
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