Copper-Vapor-Assisted Chemical Vapor Deposition for High-Quality and Metal-Free Single-Layer Graphene on Amorphous SiO2 Substrate

Published 2013 View Full Article

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Title
Copper-Vapor-Assisted Chemical Vapor Deposition for High-Quality and Metal-Free Single-Layer Graphene on Amorphous SiO2 Substrate
Authors
Keywords
-
Journal
ACS Nano
Volume 7, Issue 8, Pages 6575-6582
Publisher
American Chemical Society (ACS)
Online
2013-07-20
DOI
10.1021/nn402847w

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