Journal
ACS NANO
Volume 3, Issue 10, Pages 2887-2900Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn9007059
Keywords
local probe oxidation; nanolithography; nanopatterning; self-assembled monolayer (SAM); hydrogen-terminated silicon; N-hydroxysuccinimide (NHS); XPS analysis
Categories
Funding
- Dutch Polymer Institute (DPI)
- NWO
- Fonds der Chemischen Industrie
- Dutch Ministry of Economic Affairs [WSC.6972]
Ask authors/readers for more resources
Local probe oxidation experiments by conductive AFM have been performed on a hexadecyl monolayer and N-hydroxysuccinimide (NHS)-ester-functionalized undecyl (NHS-UA) monolayer assembled on hydrogen-terminated (i.e., unoxidized) silicon. The oxidation conditions for the mild oxidation of the top terminal groups of monolayers and the deep oxidation of the underlying silicon into silicon oxide were investigated. The results show that the bias threshold for the AFM tip-induced oxidation of the top groups of monolayers on oxide-free silicon can be reduced by 2 V for the methyl-terminated hexadecyl monolayer and even by 3.5 V for the active NHS-ester-terminated undecyl monolayer, in comparison to a methyl-terminated octadecyl trichlorosilane (OTS) monolayer on oxidized silicon. Upon such local mild oxidation, the active NHS ester group of the NHS-UA monolayer is selectively cleaved off to generate carboxyl-containing monolayer nanopatterns, opening further possibilities for subsequent patterned multifunctionalization.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available