Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone

Published 2014 View Full Article

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Title
Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 6, Issue 15, Pages 11834-11838
Publisher
American Chemical Society (ACS)
Online
2014-07-16
DOI
10.1021/am5032105

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