High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications

Published 2014 View Full Article

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Title
High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 6, Issue 23, Pages 21389-21396
Publisher
American Chemical Society (ACS)
Online
2014-11-12
DOI
10.1021/am506391n

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