Article
Materials Science, Multidisciplinary
Zhongchao Zhou, Xu Zhang, Rui Xu, Lina Xu, Yihong Ding, Hongping Xiao, Xinhua Li, Aidong Li, Guoyong Fang
Summary: The ALD/MLD mechanism of alucone was investigated using density functional theory calculations. It was found that three organic precursors can react with the surface through four-membered ring and six-membered ring pathways, with the latter being more favorable. The reactivity order of the precursors is EG > OX > EDA. The reactivity order of trimethylaluminum (TMA) on different surfaces is also in accordance with that of the precursors. These findings provide theoretical guidance for the design and growth of metalcone organic-inorganic hybrid materials through ALD/MLD.
MATERIALS TODAY COMMUNICATIONS
(2023)
Article
Multidisciplinary Sciences
Seung Woo Lee, Heyjin Cho, Choel-Min Jang, Myung-Soo Huh, Sung Min Cho
Summary: A simple sidewall patterning process for organic-inorganic multilayer thin-film encapsulation (TFE) has been proposed and demonstrated. The process involves adhesion lithography on an Al2O3 thin film grown by atomic layer deposition (ALD) using a self-assembled monolayer (SAM) pattern formed by a shadow mask. Sidewall patterning of multilayer TFE was achieved by repeating the adhesion lithography and vapor deposition of organic polymer and SAM patterns. The proposed process allows for the accurate patterning of blanket ALD-grown Al2O3 thin films using a predefined SAM pattern with a shadow mask.
SCIENTIFIC REPORTS
(2023)
Article
Chemistry, Physical
Chen-Hsiang Ling, Chun-Yi Chou, Tsai-Fu Chung, Jing-Jong Shyue, Jer-Ren Yang, Miin-Jang Chen
Summary: Layer-by-layer conformal atomic layer etching (cALE) technique achieves precise etching of Ge with self-limiting and self-stop processes, showing linear dependence of etching depth on cALE cycles, accurate etching rate, and low surface roughness without damaging the Ge surface.
SURFACES AND INTERFACES
(2022)
Article
Chemistry, Multidisciplinary
Junli Liu, Mingxin Wang, Maria C. Dipalo, Jing Zhuang, Wenxiong Shi, Xun Wang
Summary: The study successfully prepared CuO-PMA-Ag sub-1 nm nanosheet heterostructures with excellent catalytic activity, paving the way for the synthesis and broader applications of multi-component 2D hybrid sub-1 nm heterostructures.
Review
Chemistry, Analytical
Guangzhou Geng, Zhongshan Zhang, Chensheng Li, Ruhao Pan, Yunlong Li, Haifang Yang, Junjie Li
Summary: This article provides a comprehensive overview of a powerful fabrication method for 3D nanostructures based on atomic layer deposition assisted assembly through various sacrificial templates, and explores the potential of this method for nanodevice applications.
Article
Nanoscience & Nanotechnology
Mikko Nisula, Antti J. Karttunen, Eduardo Solano, Girish C. Tewari, Maarit Karppinen, Matthias Minjauw, Himanshu Sekhar Jena, Pascal Van der Voort, Dirk Poelman, Christophe Detavernier
Summary: The study explores the relationship between the electrical conductivity, structure, and oxidation state of one-dimensional coordination polymer thin films of N,N'-dimethyl dithiooxamidato-copper prepared by atomic/molecular layer deposition. The results indicate that the electrical conductivity of the films is highly dependent on the oxidation state, with a significant increase in conductivity upon partial reduction and the observed metallic behavior in the high-conductance state.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Materials Science, Coatings & Films
Nupur Bihari, Ismo T. S. Rauha, Giovanni Marin, Craig Ekstrum, Chathura de Alwis, Pierce J. Mayville, Hele Savin, Maarit Karppinen, Joshua M. Pearce
Summary: The potential of 3-D printing polymers in low-weight space flight hardware and vacuum equipment has attracted increasing interest. However, the formation mechanisms of atomic layer deposition (ALD) coatings on 3-D printed polymers are not well understood, limiting their use in vacuum environments. This study investigates the film formation mechanisms of ALD alumina on porous 3-D printed polymers, revealing that substrate porosity and polymer functionality play a dominant role in film formation behavior.
SURFACE & COATINGS TECHNOLOGY
(2023)
Article
Chemistry, Multidisciplinary
Kyungjin Kim, Matthias Van Gompel, Kangling Wu, Giuseppe Schiavone, Julien Carron, Florian Bourgeois, Stephanie P. Lacour, Yves Leterrier
Summary: The authors investigated thin encapsulation multilayers for bioelectronics, finding they displayed excellent hermetic lifetime and mechanical integrity, even with partial cracks.
Article
Materials Science, Biomaterials
Sizhe Huang, Sabrina Urbina Villafranca, Iyanah Mehta, Omri Yosfan, Eunji Hong, Anyang Wang, Nianqiang Wu, Qianbin Wang, Siyuan Rao
Summary: This study aims to improve the stability of chemically cross-linked poly(vinyl alcohol) (PVA) hydrogel fibers by using atomic layer deposition (ALD) to coat them with an inorganic silicon dioxide (SiO2) layer. SiO2-coated PVA hydrogel fibers showed superior stability and preserved their mechanical and optical properties compared to uncoated fibers. In vivo experiments demonstrated that these SiO2-coated PVA hydrogel fibers could be used to optically activate the motor cortex and modulate locomotor behaviors in transgenic mice.
JOURNAL OF MATERIALS CHEMISTRY B
(2023)
Article
Chemistry, Multidisciplinary
Jingwei Shi, Stacey F. Bent
Summary: Ionic liquid assisted MLD (IL-MLD) is an improved technique that expands the range of chemical reactions and overcomes limitations of traditional MLD by using ionic liquids. IL-MLD enables the synthesis of polymers and may be applied to other vapor deposition techniques.
Article
Chemistry, Multidisciplinary
Zhenzhen Zhang, Assaf Simon, Clarissa Abetz, Martin Held, Anke-Lisa Hohme, Erik S. Schneider, Tamar Segal-Peretz, Volker Abetz
Summary: The study demonstrates a versatile top-down approach to produce high-performance membranes using isoporous block copolymer membranes and metal oxide growth, enabling high selectivity molecular separation.
ADVANCED MATERIALS
(2021)
Review
Chemistry, Multidisciplinary
Helen Hejin Park
Summary: ALD plays a crucial role in the development of PSCs, offering new possibilities for improving efficiency, stability, and scalability through its applications in charge transport layers, passivation layers, and buffer and recombination layers. Future research directions and challenges will also be discussed.
Article
Chemistry, Multidisciplinary
Pol Salles, Ivan Cano, Roger Guzman, Camilla Dore, Agustin Mihi, Wu Zhou, Mariona Coll
Summary: A simple chemical route to prepare water-soluble epitaxial Sr3Al2O6 thin films as sacrificial layers for future free-standing epitaxial complex oxide manipulation is proposed in this study. These thin films, prepared using metal nitrate and metalorganic precursors, exhibit dense, homogeneous, and epitaxial characteristics that can be easily etched for the fabrication of artificial heterostructures. This robust and cost-effective methodology has the potential to be applied in a wide range of thin film fabrication for advanced electronic, spintronic, and energy conversion devices beyond traditional applications.
ADVANCED MATERIALS INTERFACES
(2021)
Article
Engineering, Electrical & Electronic
Jie Yang, Ruiqi Jiang, Chang Chen, Junhui Chen, Zixin Cao, Yawei Li, Liyan Shang, Kai Jiang, Jinzhong Zhang, Liangqing Zhu, Zhigao Hu, Junhao Chu
Summary: This study presents a new preparation strategy for the synthesis of 2D Bi2O2Se films and nanosheets using the chemical vapor deposition (CVD) method. The growth mode of Bi2O2Se films and nanosheets was systematically investigated. It was found that the films follow a layer-by-layer growth mode on mica substrates, while a three-dimensional growth mode was observed on silicon substrates. The concentration of the precursor greatly affects the topography of the Bi2O2Se nanosheets. These findings provide valuable insights for the preparation and device fabrication of Bi2O2Se.
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
(2023)
Article
Chemistry, Physical
Qiuping Yang, Daowei Gao, Chunsheng Li, Shuai Wang, Xun Hu, Gengxiu Zheng, Guozhu Chen
Summary: A partial deligandation strategy was proposed to support highly dispersed Pt nanoparticles on MOFs-derived porous materials. Pt/CeO2-270 catalyst was prepared by partially decomposing Ce-MOFs at 270 degrees C and depositing Pt nanoparticles via atomic layer deposition (ALD) method. The CeO2-270 catalyst with residual organic ligands exhibited larger surface area, extensive porous structure, and abundant Ce3+ and oxygen vacancies, which stabilized the highly dispersed Pt nanoparticles. The Pt/CeO2-270 catalyst showed excellent furfural (FAL) conversion (100%) and high selectivity (97.3%) for furfuryl alcohol (FOL).
APPLIED CATALYSIS B-ENVIRONMENTAL
(2023)
Article
Chemistry, Inorganic & Nuclear
Rachel A. Nye, Siyao Wang, Stefan Uhlenbrock, John A. Smythe, Gregory N. Parsons
Summary: This study investigates the growth initiation and growth rate evolution during MLD of polyurea films, showing that the growth rate can substantially change depending on the substrate and reactants used. The transition from initial to steady growth is attributed to a change in active surface site density.
DALTON TRANSACTIONS
(2022)
Review
Materials Science, Coatings & Films
Hanan Alexandra Hsain, Younghwan Lee, Monica Materano, Terence Mittmann, Alexis Payne, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Summary: This review summarizes the process knowledge accumulated in the field of ferroelectric HfO2 over the past 10 years. It examines the effect of process parameters in different deposition methods on film microstructure, phase evolution, defect concentration, and electrical properties. The goal is to provide a comprehensive guide for the design of future HfO2-based ferroelectric materials and devices.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2022)
Article
Chemistry, Multidisciplinary
Sarah E. Morgan, Morgan L. Willis, Gregory W. Peterson, John J. Mahle, Gregory N. Parsons
Summary: Metal-organic framework (MOF)-fabric composites have been synthesized using green solvents and a sorption-vapor approach. The composites showed higher MOF loading and surface area compared to those made with harmful solvents. The scalability of the process was confirmed and the composites exhibited superior performance for hydrolysis reactions. The study also explored the use of different MOFs for fabric composites.
ACS SUSTAINABLE CHEMISTRY & ENGINEERING
(2022)
Article
Chemistry, Physical
Holger Saare, Golnaz Dianat, Gregory N. Parsons
Summary: This work compares the initial growth trends of aluminum oxide using different precursors and oxygen sources on silicon surfaces. The results show that precursor selection affects the deposition rate and selectivity.
JOURNAL OF PHYSICAL CHEMISTRY C
(2022)
Article
Nanoscience & Nanotechnology
H. Alex Hsain, Younghwan Lee, Suzanne Lancaster, Patrick D. Lomenzo, Bohan Xu, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Summary: By inserting a 1 nm Al2O3 layer at the HZO/TiN interface, a protective passivating layer is introduced, resulting in improved remanent polarization and endurance of TiN/HZO/TiN capacitors.
Article
Chemistry, Physical
Hwan Oh, Jung-Sik Kim, Hannah R. M. Margavio, Gregory N. Parsons
Summary: In this work, the researchers successfully achieved multi-material ASD by sequentially combining two intrinsic ASD processes. They also found that the properties of PEDOT and W ASD materials are affected by the ASD sequence. Additionally, they demonstrated the feasibility of orthogonal ASD at the nanoscale and showed that the PEDOT layer can control the lateral growth of W onto the non-growth surface.
CHEMISTRY OF MATERIALS
(2023)
Article
Chemistry, Physical
Rachel A. Nye, Kaat Van Dongen, Danilo De Simone, Hironori Oka, Gregory N. Parsons, Annelies Delabie
Summary: Extreme ultraviolet (EUV) lithography is crucial for next-generation technology, but the low etch resistance of conventional organic EUV resists leads to poor resolution. This study combines area-selective deposition (ASD) with EUV resists to create resist hardening or tone inverting layers for improved resolution. Different scenarios for selective deposition are achieved by tuning the polymer structure and functionality. Results show promise for tone inversion using cyclohexyl protecting group and resist hardening using tert-butyl protecting group. Inhibitors are also integrated to further broaden applications. This work establishes an important baseline for using ASD on organic resists to improve EUV pattern resolution.
CHEMISTRY OF MATERIALS
(2023)
Article
Physics, Applied
H. Alex Hsain, Younghwan Lee, Patrick D. Lomenzo, Ruben Alcala, Bohan Xu, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Summary: Ferroelectric hafnium-zirconium oxide (HZO) is a promising material for low-power non-volatile memory applications due to its ferroelectricity at the nanoscale and compatibility with silicon-based technologies. The interface between HZO and its electrode is crucial for device performance. In this study, the effect of breaking vacuum during the sequential deposition steps is investigated. The results show that breaking vacuum after bottom electrode deposition leads to interfacial oxidation and increased carbon contamination, which affect the ferroelectric properties.
JOURNAL OF APPLIED PHYSICS
(2023)
Article
Chemistry, Multidisciplinary
Niklas D. Keller, Pierpaolo Vecchi, David C. Grills, Dmitry E. Polyansky, Gabriella P. Bein, Jillian L. Dempsey, James F. Cahoon, Gregory N. Parsons, Renato N. Sampaio, Gerald J. Meyer
Summary: Photovoltages for hydrogen-terminated p-Si(111) in an acetonitrile electrolyte were quantified using MV2+ and [Ru(bpy)3](PF6)2. The reduction potentials of MV2+ occurred within the forbidden bandgap, while those of [Ru(bpy)3]2+ occurred within the conduction band states. The study reveals that the most optimal photovoltage, electron-hole pair lifetime, and surface electron concentration occur when the reduction potentials lie energetically within the unfilled conduction band states with an inversion layer.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
(2023)
Article
Materials Science, Coatings & Films
Jan-Willem J. Clerix, Golnaz Dianat, Annelies Delabie, Gregory N. Parsons
Summary: This study investigates the adsorption of DMATMS on SiO2 and the subsequent reactions during TiCl4/H2O ALD. It is found that DMATMS selectively reacts with -OH groups on SiO2 and inhibits the reaction with TiCl4. Additionally, DMATMS can also react with residual -OH groups and reduce nucleation. The effectiveness of DMATMS passivation on SiO2 and H-terminated Si is quantified using Rutherford backscattering spectrometry.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Article
Materials Science, Coatings & Films
Holger Saare, Wenyi Xie, Gregory N. Parsons
Summary: Recent advances in the semiconductor industry have led to the demand for conformal deposition and etching processes in three-dimensional devices. This study investigates thermal atomic layer etching (ALE) of TiO2 and ZrO2 using different co-reactants. The results show that the choice of co-reactant affects the saturation and etch rates at different temperatures. The study expands the understanding of co-etchants' role in thermal ALE and increases the range of reactants for vapor etching of metal oxides.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
(2023)
Article
Chemistry, Multidisciplinary
Rachel A. A. Nye, Kaat Van Dongen, Jean-Francois de Marneffe, Gregory N. N. Parsons, Annelies Delabie
Summary: Area-selective deposition (ASD) has potential for sub-10 nm manufacturing, but scaling to ultrasmall dimensions and understanding feature-dependent nonuniformity and selectivity loss remains challenging. This work addresses these challenges by quantifying uniformity and selectivity for passivation/deposition/etch supercycles in 45 nm half-pitch TiN/SiO2 line/space patterns. Three selective processes were used: DMA-TMS inhibition, TiO2 ALD, and HBr/BCl3 plasma etch. By employing three supercycles, this work achieves 8 nm of TiO2 with high uniformity and selectivity, improving on previous reports in similar nanoscale patterns. Integrated consideration of uniformity and selectivity will aid the design of selective deposition processes for nanoscale electronic devices.
ADVANCED MATERIALS INTERFACES
(2023)
Article
Engineering, Chemical
Sarah E. E. Morgan, Carwynn D. D. Rivera, Morgan L. L. Willis, Gregory W. W. Peterson, John J. J. Mahle, Laura Mundy, Gregory N. N. Parsons
Summary: Metal-organic framework (MOF) fabric composites combine important MOF chemistry with flexible, strong fabric substrates and have various applications. This study investigates the relationship between process parameters, MOF properties, and MOF performance for UiO-66-NH2 fabric composites. It was found that the number of SVS cycles significantly impacted the performance of the MOF-fabrics.
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH
(2023)
Article
Chemistry, Physical
Scott McGuigan, Stephen J. Tereniak, Carrie L. Donley, Avery Smith, Sungho Jeon, Fengyi Zhao, Renato N. Sampaio, Magnus Pauly, Landon Keller, Leonard Collins, Gregory N. Parsons, Tianquan Lian, Eric A. Stach, Paul A. Maggard
Summary: This study presents a functional hybrid photocatalyst system using a crystalline carbon nitride semiconductor, poly(triazine imide) lithium chloride (PTI-LiCl), and a CoCl2(qpy-Ph-COOH) catalyst for CO2 reduction. The optimized catalyst loading achieved high rates and selectivity for CO production, which were further improved by increasing the incident irradiance. Higher surface loadings were found to extend the lifetime of the molecular catalysts.
ACS APPLIED ENERGY MATERIALS
(2023)
Article
Chemistry, Physical
Vahid Rahmanian, Muhammed Ziauddin Ahmad Ebrahim, Seyedamin Razavi, Mai Abdelmigeed, Eduardo Barbieri, Stefano Menegatti, Gregory N. Parsons, Fanxing Li, Tahira Pirzada, Saad A. Khan
Summary: This study presents a novel method for synthesizing metal-organic frameworks (MOFs) on 3D-structured nanofibrous aerogels (NFAs). The resulting hybrid aerogels exhibit promising applications in CO2 adsorption, heavy metal removal, and antibacterial properties.
JOURNAL OF MATERIALS CHEMISTRY A
(2023)
